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硬X 線集光ビームを用いた高分解能回折顕微法の

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硬X 線集光ビームを用いた高分解能回折顕微法の
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Fig. 1
Schematic view of source, elliptical mirror, and slit arrange­
ment in the present simulation. x and z correspond to the
horizontal and vertical directions, respectively.
çÍ][“vŒ[gÉæèWõ³ê½ X ür[€ðgÁ
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4.1
Fig. 2 Photon density proˆles of x rays focused by ˆrst and second
mirrors in Table 1, which are calculated one dimensionally in
the vertical and horizontal directions when cross­slit sizes are
10, 50, 80, and 120 mm in arrangement drawn in Fig. 1.
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úËõ May 2010 Vol.23 No.3 œ 189
Table 1
Parameter of designed elliptical mirrors
First mirror
Second mirror
1.30
113
1.05
90
Focal lengthimmj
Length of major axisimj
600
48.600
495
48.600
Length of minor axisimmj
6.708
4.880
Maximum glancing angleimradj
Acceptance widthimmj
Fig. 3
Double­slit interval dependence of visibility calculated in the
vertical and horizontal directions. The center of the double
slit is on the optical axis.
¹TCYªÙÈé±ÆÉRˆµÄ¢éB
ŸÉWõ_ÅÌóÔRq[Œ“XÉ¢IJ׽BFig.
1 ɦ·æ¤ÉWõ_É̈́“OXŠbgðzuµCãû
Å Ì ± Â È © ç Fringe visibility ð v Z µ ½ B Fig. 3 É
Fringe visibility ̄“OXŠbgÔu˶«ð¦·B‚
¼C…½ûüÆàÉC48 m ã¬ÌNXXŠbgÌJû
TCY̝ÁƤÉCWõr[€àÌóÔRq[Œ“Xª
Fig. 4
Appearance of elliptical mirrors fabricated by EEM tech­
nique.
Fig. 5
Appearance of coherent x­ray diŠraction microscope with
KB mirrors at BL29XUL in SPring­8.
ặéBܽC…½ûü͂¼ûüÆä×ÄRq[Œ“
XÌẪ°˜Å éB±êàCWõõq§xƯlÉõ
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1.5 mm ð´¦éÆ Fringe visibility ÌÏ»ª¡GÉÈéB
±êÍCWõC“r[€üèÌTe‰Cg¬ªÌe¿É
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í¹Ä 2 Ÿ³Wõ·êÎCWõa`1 mm ÅCõq§x
ð”S{öxÜŝÁÅ«éƾ¦éBܽCNXXŠ
bgªWõr[€àÌ X üõq§xÆóÔRq[Œ“X
ð§ä·éð„ðS¢CNXXŠbgðKØÈJûTC
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ÉRq[Œ“gÈ X üðÆËÅ«é±Æªª©éBµ©
µÈªçC2 …Èãt‰bNX§xðÁ³¹éÉÍCŽ
xÉwüµ½BFig. 4 É~‰[ÌOϨæÑ`óë·ªz
¿TCYª`200 nm ȺÅÈ¢ÆRq[Œ“gÆË·é
ð¦·B~‰[Ì޿͇¬ÎpÅ èC~‰[LøÌæ
±Æª¢ïÅ éB·Èí¿CWõr[€aæè\ª¬³
Í 5 mm~90 mm Å èC`óë· 1 nmiP_VjC\Êe
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³0.11 nmiRMSjÅ éBX üÎüËpð`1 mrad Æ
s¦È¢Æ¾¦éB
Èéæ¤ÉÝvµÄ¢é½ßC\ÊÉà®R[eB“O¹
¸É`10 keV Ì X üÉ¢Ä99÷Èã̂¢½Ë¦ª¾
4.2
KB
~‰[ðõ¦½ñÜ°÷@•uÌJ­16)
çêéB
KB ~‰[ðgÁçxÉ X üðWõ·éÉÍC
±Ì~‰[ðõ¦½Wõ†jbgðñÜ°÷@•uÉg
z`óÉß­C‚¢ X ü½Ë¦ðàÁ½~‰[Å éK
ݞÝC‚ªð\ñÜ°÷@•uð\zµ½BFig. 5 ɕ
vª éBæÁÄCoˆéÀè`óë·C\Êe³Ì¬³
uÌOÏð¦·BKB ~‰[ðõ¦½Wõ†jbgðåC
¢~‰[Å é±Æª]ܵ¢BåãåwÌRà³öÌO
†ÉÝuµCJvg“‹ðʵÄC^ó`ƒ“o[àÅ
‹[vÅJ­³ê½ Elastic Emission Machining (EEM)
X üÍWõ³êéBWõ_ÉCT“v‹ðzuµC»Ì
Zp17) ÍC`óë·C\Êe³ðim[g‹I[_[
OûU­xðŽ¿©çñ 1 m º¬ÉÝu³êé¼ÚB
ÜŬ³­·é±ÆÌÅ«éæúIÈÁHZpÅ èC»
œ^ CCD ŸoíiPrinceton Instruments PI_LCX1300j
ÝC”®ïÐWFCebN18)©ç EEM ÁHÉæè컵
Ūè·éB
½~‰[i¤i¼FOSAKA MIRRORjðwü·é±Æ
ªÅ«éBäXÍCTable 1 ÌfUC“Ì~‰[ð2008N
190
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X üWõZpÁW ¡ d X üWõr[€ðp¢½‚ªð\ñÜ°÷@ÌJ­Æ»Ì«ˆW]
Fig. 6
4.3
(a) Experimental setup for coherent x­ray diŠraction pattern
measurements of silver nanocube using x rays focused by KB
mirrors. The nanocube was placed at the center of the beam
waist. (b) Intensity distribution proˆle along vertical and
horizontal directions of the focused beam. The proˆle was
derived by diŠerentiating the x­ray absorption distribution
of the gold wires at 250 nm intervals. (c) SEM image of sil­
ver nanocubes.
âimL…[uðp¢½‚ªð\ñÜ°÷@Ìf
‚“XgŒ[V‡“À±19)
J­µ½‚ªð\ñÜ°÷@•uðp¢½f‚“Xg
Fig. 7
(a) Coherent diŠraction pattern of silver nanocube in 1251
~1251 pixels. q is deˆned as q2 sin (U/2)/l, where U is
the scattering angle and l is the x­ray wavelength. (b) Ex­
panded image of the area inside the square in (a). (c) q de­
pendence, along the white line indicated in (a), of photon
numbers detected at one pixel of the CCD detector for the
high­q diŠraction measurement.
Œ[V‡“À±ð SPring­8 Ì BL29XUL ÉÄsÁ½BŽ
¿ÉÍ|ŠI[‹Ò³@Éæè컳ê½200 nm ȺÌ
imL…[uðHºµCǧµ½imL…[uÌÊuÀW
TCYÌâimL…[u±qðp¢½20) B±ÌâimL
ðXP[‰[‹ÚÌõw°÷¾Éæèˆèµ½B»ÌÊu
…[uÍP‹»Å èC\ÊÍ´qŒx‹Å½ŠÈ{100}
ÀWð³ÉCimL…[uÉ X üWõr[€ðÆ˵
ÊÅ\¬³êéB3 ÍÅq×½æ¤ÉC200 nm ȺÌT
½BimL…[u©çÌU X ü­xð CCD ŸoíŪ
CYÌǧŽ¿ðªè·éê‡CWõÉæét‰bNX§
èµCU­xªÅåÆÈéêŠC·Èí¿CFig. 6(a)Ì
x̝ÁðúÒÅ«éBFig. 6(a)ÉÀ±zuð¦·BWõ
}ü}É éæ¤ÉCimL…[uªWõr[€Ì†SÆ
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½ÊgÉæÁÄƾ³êéÆߗūéB
keV ÉPF»µC~‰[æè50 m ã¬ÉÝu³êéN
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XXŠbgÌJûð100 mm Ƶ½BFig. 6(b)ɏC„[
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XLƒ“@ÉÄvªµ½…½ûüC‚¼ûüÌWõvt
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è·éÆCWõ_ɨ¯ét‰bNX§xÍ`1.0~104
½âimL…[uÌñÜp^[“Å éB\šóÌÁ_Í
ph/s/nm2 Å éÆ©Ïàçê½BFig. 6(c)ÉâimL
lªág”©ç‚g”ÌæÉLÑÄ¢é̪ª©éB±Ì
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©çÌt‰E“z[t@[ñÜp^[“Ư¶Å éB»
úËõ May 2010 Vol.23 No.3 œ 191
mFig. 8(c)nB±êÜÅ X üñÜ°÷@ÅÍC10 nm ð´¦
éªð\7,24) ªñ³êÄ¢éªC±Ì 3 nm ªð\Í»
êçðãñé¢Eł̪ð\Å éB
5. ÜÆßÆ«ˆW]
{eÅÍCS½Ë~‰[ÉæèWõµ½d X ür[€
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Fig. 8
(a) Projection image of the sliver nanocube reconstructed
from the diŠraction pattern in Fig. 7(a) in which a line scan
through an edge shown in the inset demonstrates the resolu­
tion of `3 nm. The reconstructed image is normalized by
the maximum value of image intensities and is displayed in
gray scale. (b) Phase retrieval transfer function (PRTF) for
the reconstructed image of (a). The half­period resolution
of the image of (a) is 3.0 nm, where the PRTF drops to a
value of 1/e. (c) SEM image of the silver nanocube.
ÍÍÅ Á½½ßCPêtŒ[€ÌñÜ­xf[^©çÌ
ñŸ³œÌÄ\¬ªÂ\Å Á½B¡ãCæè‚g”Ìæ
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úËõ May 2010 Vol.23 No.3 œ 193
Development of high­resolution diŠraction
microscopy using focused hard X­ray beam
and a perspective
Yukio TAKAHASHI
Frontier Research Center, Graduate School of Engineering, Osaka University,
2_1_1 Yamada­oka, Suita 565_0862, Japan
Abstract X­ray diŠraction microscopy is a lensless x­ray microscopy combining coherent X­ray scattering
and phase retrieval calculation, allowing to visualize the electron density distribution of thick objects with a
high spatial resolution because of its high penetration power and short wavelength. In this study, we deve­
loped the high­resolution diŠraction microscope using hard X­rays focused by total re‰ection mirrors, and real­
ized a 3 nm spatial resolution in the demonstration experiment using the silver nanocube as a sample. By using
X­ray free electron lasers, ultimate x­ray diŠraction microscopy will realize by using focused hard X­ray free
electron lasers.
194
œ úËõ May 2010 Vol.23 No.3
Fly UP